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发明名称
Verfahren zur Herstellung einer Halbleitervorrichtung
摘要
申请公布号
DE102005014722(B4)
申请公布日期
2009.07.30
申请号
DE200510014722
申请日期
2005.03.31
申请人
DENSO CORPORATION;SUMITOMO MITSUBISHI SILICON CORP.
发明人
YAMAUCHI, SHOICHI;YAMAGUCHI, HITOSHI;MAKINO, TOMOATSU;NOGAMI, SYOUJI;YAMAOKA, TOMONORI
分类号
H01L21/336;H01L29/06;H01L21/20;H01L21/205;H01L21/338;H01L21/8234;H01L29/78
主分类号
H01L21/336
代理机构
代理人
主权项
地址
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