发明名称 Composition for cleaning a phase shift mask and associated methods
摘要 A composition for cleaning a phase shift mask, including an organic acid ammonium salt, wherein a base ionization constant (Kb) of organic acid ions is larger than an acid ionization constant (Ka) of ammonium ions, hydrogen peroxide, and water, and associated methods.
申请公布号 US2009191471(A1) 申请公布日期 2009.07.30
申请号 US20080318510 申请日期 2008.12.30
申请人 LEE DONG-HUN;JEONG HAE-YOUNG;HAN SUNG-JAE;LEE HAN-SHIN 发明人 LEE DONG-HUN;JEONG HAE-YOUNG;HAN SUNG-JAE;LEE HAN-SHIN
分类号 G03F1/00;C11D7/18 主分类号 G03F1/00
代理机构 代理人
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