ATOMIC LAYER GROWING APPARATUS AND THIN FILM FORMING METHOD

摘要

An antenna array for generating plasma by using an oxide gas and a substrate stage for placing a substrate are arranged in a film forming container. An antenna element is provided by coating a bar-like antenna main body with a dielectric material, and the antenna array is configured by arranging a plurality of antenna elements in parallel to each other. Furthermore, the antenna array is arranged in a space in the upstream in a gas flow direction of the oxide gas supplied to the substrate stage from a supply port formed on the side wall of the film forming container, compared with a position where the substrate is placed on the substrate stage.