| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus which has a long life and hardly generates dust. SOLUTION: The plasma processing apparatus 1 has a protection member 14 in contact with plasma. A protection layer 18 containing yttria as a main component is exposed on a surface of the protection member 14. The protection layer 18 is not etched in plasma and a base 16 is protected. A base layer 17 is disposed between the protection layer 18 and the base 16. A base material constituting the base layer 17 has a thermal expansion coefficient intermediate between yttria and aluminum, and accordingly even if thermal expansion or thermal contraction occurs, the protection layer 18 will not be detached from the base 16. COPYRIGHT: (C)2009,JPO&INPIT
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