发明名称 COATING SOLUTION SUPPLY APPARATUS
摘要 PROBLEM TO BE SOLVED: To use a coating solution for a long time while stably supplying the coating solution even when the coating solution having high reactivity is used. SOLUTION: A coating solution supply apparatus 30 has a coating solution supply source 40 and a pump 70 for forcibly feeding the coating solution supplied from the coating solution supply source 40 to a coating nozzle 20. A gaseous nitrogen supply source 4 for supplying gaseous nitrogen into the coating solution supply source 40 is connected to the coating solution supply source 40 and the inside of the coating solution supply source 40 is pressurized to a prescribed pressure. A liquid end tank 50 for once storing the coating solution and a deaeration mechanism 60 for removing a gas such as gaseous nitrogen dissolved in the coating solution are provided between the coating solution supply source 40 and the pump 70. The pump 70 is connected to the coating nozzle 20 via a pipe line 73. A filter 80 for removing impurities in the coating solution is provided to the pipe line 73. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009166007(A) 申请公布日期 2009.07.30
申请号 JP20080010242 申请日期 2008.01.21
申请人 TOKYO ELECTRON LTD 发明人 FUJII HIROYUKI;NISHIJIMA KAZUHIRO
分类号 B05C11/10 主分类号 B05C11/10
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