发明名称 THIN FILM FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method of forming a uniform and high-quality thin film by measuring accurately the amounts of droplets discharged from individual discharge nozzles of the droplet discharge head and controlling the discharge amounts on the basis of the results of the measurement. SOLUTION: The thin film forming method has a defective inspection process based on discharge characteristics of a droplet discharge head 151 manufactured newly and used in a droplet discharge method, the discharge characteristics inspection process of inspecting discharge characteristics of the discharge nozzle NZ of the droplet discharge head 151 in using the droplet discharge head 151 and the thin film forming process of forming a thin film by using the droplet discharge head 151. In the discharge characteristics inspection process, differences between discharge characteristics of two or more discharge nozzles NZ are detected, and defectiveness of the droplet discharge head 151 is also detected on the basis of the differences in the discharge characteristics. The discharge amount is measured by discharging a liquid material from a discharge nozzle NZ onto a test plate TP having a controlled contact angle and measuring the amount of the liquid material by optical interferometry. The contact angle of the liquid material to the test plate TP used in the defective inspection process is equal to that to the test plate TP used in the discharge characteristics inspection process. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009165945(A) 申请公布日期 2009.07.30
申请号 JP20080005925 申请日期 2008.01.15
申请人 SEIKO EPSON CORP 发明人 ISHIZUKA HIROTAKA;IMAI TAKAHIRO;IGARASHI TORU;KATAUE SATORU;HIRUMA TAKASHI;KOMORI SADAJI;ITO GOJI
分类号 B05D1/26;B05D3/00;G02B5/20 主分类号 B05D1/26
代理机构 代理人
主权项
地址