| 摘要 |
<p>Provided is a polymer scale deposition inhibitor for the polymerization of a monomer having an ethylenic double bond. The inhibitor comprises: (A) a product of the condensation of an aldehyde compound with a hydroxynaphthalene compound; and (B) an organic phosphoric acid compound (B1), an inorganic phosphoric acid compound (B2) having 3 or more phosphorus atoms, or a combination of these compounds. A scale-preventive coating film having the sufficient ability to prevent scale deposition can be formed from the inhibitor through one coating operation with high productivity. Even when batch polymerization is repeated many times under high-temperature polymerization conditions, polymer scale deposition on, e.g., the inner wall of the polymerizer can be effectively prevented. The scale inhibitor can be applied in a layer thickness reduced to 0.2 mm or smaller and can hence mitigate troubles, for example, that the cooling ability of the polymerizer jacket decreases and that a scale inhibitor layer which has peeled off comes into a polymer product and is causative of a coloring foreign matter. Thus, a polymer product having improved quality can be obtained.</p> |
