发明名称 POSITIVE PHOTOSENSITIVE POLYMER COMPOSITION
摘要 A positive photosensitive polymer composition of the invention contains: a copolymer obtained by the radical polymerization of monomers including a radical polymerizable monomer (a1) having a (meth)acryloyl group and a polyalkylene glycol group a terminal of which is an alkoxy group; and a 1,2-quinone diazide compound. The positive photosensitive polymer composition may further contain a copolymer obtained by the radical polymerization of monomers not including the monomer (a1).
申请公布号 US2009191386(A1) 申请公布日期 2009.07.30
申请号 US20090353689 申请日期 2009.01.14
申请人 CHISSO CORPORATION 发明人 TAKAHASHI TOSHIYUKI;WATANABE EIJI;ETOU TOMOHIRO;KIMURA YUUKI
分类号 B32B3/10;G03F7/039 主分类号 B32B3/10
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