| 摘要 |
Apparatus (10) for projecting a pattern includes a first diffractive optical element (DOE) (12) configured to diffract an input beam (20) so as to generate a first diffraction pattern (23) on a first region (22) of a surface (24), the first diffraction pattern including a zero order beam (32). A second DOE (14) is configured to diffract the zero order beam so as to generate a second diffraction pattern (29) on a second region (27) of the surface such that the first and the second regions together at least partially cover the surface. |
