发明名称 SEMI-CONDUCTOR STRUCTURE AND METHOD FOR THE PRODUCTION OF A SEMI-CONDUCTOR STRUCTURE
摘要 The invention relates to a semi-conductor structure, comprising an n metallization and a p metallization (7), and a semi-conductor substrate having an n-doped base region and a p-doped emitter region (2) adjoining the same at least partially for configuring an emitter/base p-n junction, wherein the emitter region (2) extends at least partially approximately parallel to an emitter surface (2b) of the semi-conductor substrate, and the n metallization is connected to the base region, and the p metallization (7) is connected to the emitter region (2) in an electrically conductive manner. It is essential to the invention that the semi-conductor structure further comprises an n-doped passivation region (5), which is disposed at least partially between the emitter surface (2b) and the emitter region 2, wherein the passivation region (5) is neither connected to the n metallization nor to the p metallization (7) in an electrically conductive manner. The invention further relates to a method for the production of such a semi-conductor structure.
申请公布号 WO2009092424(A2) 申请公布日期 2009.07.30
申请号 WO2008EP10639 申请日期 2008.12.15
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.;ALBERT-LUDWIGS-UNIVERSITAET FREIBURG;SCHULTZ, OLIVER;BENICK, JAN;HERMLE, MARTIN 发明人 SCHULTZ, OLIVER;BENICK, JAN;HERMLE, MARTIN
分类号 H01L31/18;H01L31/0224 主分类号 H01L31/18
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