| 摘要 |
PROBLEM TO BE SOLVED: To provide a solid-state imaging device capable of completely restraining the incidence of visible light into a pixel region, and to provide a manufacturing method for such a solid-state imaging device. SOLUTION: A solid-state imaging device 1 includes a solid-state imaging element 4 having a pixel region 7, consisting of an effective pixel region 7a and a black reference pixel region 7b that are used for imaging and a microlens 9 formed above the effective pixel region 7a; a transparent lid part 5 formed above the microlens 9; a peripheral circuit part 3 formed around the solid-state imaging element 4; and a black resin 10 formed to cover the end surface of the transparent lid part 5 and the peripheral circuit part 3. A light-shielding layer 14 is provided above the black reference pixel region 7b, and an adhesion layer 15, having the light-shielding performance, is provided between the light-shielding layer 14 and the transparent lid part 5. COPYRIGHT: (C)2009,JPO&INPIT
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