| 摘要 |
A process for creating an image in a dry-film resist laminate. The dry-film resist laminate comprises in order, a peelable top layer, a layer of dry-film resist, a clear or translucent coating layer, and a peelable bottom layer. The top layer is peeled from the laminate and the laminate is applied to a surface using heat and pressure. Thereafter, an image is created in the layer of dry-film resist and the resist is developed to remove uncured portions of the layer of photoresist along with the clear or translucent coating layer.
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