发明名称 SURFACE POSITION DETECTION DEVICE, EXPOSURE EQUIPMENT, AND METHOD FOR MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a surface position detection device that can highly precisely detect the surface position of a tested surface without being affected by variation in optical members, exposure equipment, and a method for manufacturing a device. <P>SOLUTION: The surface position detection device has a light supply optical system (4, 6, 7) for guiding a first measuring beam from a first pattern (S1-S10) and a second measuring beam from a second pattern (S11) to a tested surface (Wa) to project an intermediate image of the first pattern and an intermediate image of the second pattern on the tested surface and for turning around intermediate image of the second pattern by 90 degrees, a light receiving optical system (17, 16, 14) for guiding the first and second measuring beams reflected by the tested surface to an observation surface (13a) to form observation images of the first and second patterns on the observation surface, and a detection section (13, 12, 11, PR) for detecting respective position information on the observation images of the first and second patterns at the observation surface to calculate the position of the tested surface based on the respective position information. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009170560(A) 申请公布日期 2009.07.30
申请号 JP20080005125 申请日期 2008.01.15
申请人 NIKON CORP 发明人 HIDAKA YASUHIRO
分类号 H01L21/027 主分类号 H01L21/027
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