发明名称 |
ANODIZING METHOD OF A PLASMA PROCESSING CONTAINER |
摘要 |
An anodizing method of a plasma processing container is provided to perform an anodizing process at an exterior wall which the plasma or the corrosive gas source easily infiltrates and prevent electrolyte from being spilt from a through-opening. An anodizing method of a plasma processing container comprises: a step of charging electrolyte within a plasma processing container with mounting a cover member(241) on a through-opening(164) of the plasma processing container; and a step of anodizing the plasma processing container as anode at the same time when the electrode as cathode is included inside the plasma processing container. On the wall of the surrounding of the through-opening, an arrangement estimated position of a first seal member is formed. The first seal member is arranged to maintain the inside of the plasma processing container in a vacuum.
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申请公布号 |
KR20090082132(A) |
申请公布日期 |
2009.07.29 |
申请号 |
KR20090005448 |
申请日期 |
2009.01.22 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
DEGUCHI SHINGO;YOSITUGU TANAKA |
分类号 |
C25D11/06;C25D11/04;H01L21/00 |
主分类号 |
C25D11/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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