发明名称 |
CHEMICAL VAPOR DEPOSITION APPARATUS AND METHODS OF USING THE APPARATUS |
摘要 |
<p>A chemical vapor deposition apparatus (10) comprises a heating element (12) capable of emitting electromagnetic radiation; a retort (16) positioned relative to the heating element (12) to receive the electromagnetic radiation; an encasing member (18) at least partially disposed around the retort (16), the encasing member (18) comprising a material that is at least partially transparent to the electromagnetic radiation; a plenum (20) defined at least in part by an inner surface (24) of the encasing member (18) and an outer surface (22) of the retort (16) ; and a furnace box (14) at least partially disposed around the encasing member (18) and the retort (16), and housing the heating element (12).</p> |
申请公布号 |
SG153849(A1) |
申请公布日期 |
2009.07.29 |
申请号 |
SG20090042854 |
申请日期 |
2006.12.22 |
申请人 |
GENERAL ELECTRIC COMPANY |
发明人 |
LEWIS, DANIEL JOSEPH;LOU, VICTOR LIENKONG;DALAKOS, GEORGE THEODORE;SAYLOR, MATTHEW DAVID;WEAVER, SCOTT ANDREW;RUCKER, MICHAEL HOWARD |
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