发明名称 POSITIONING APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE
摘要 <p>A positioning device, an exposure device and a device manufacturing method applicable to the exposure device are provided to determine an object by accurately compensating the arbitrary WIS generated in the manufacturing site of the device. An object is positioned to a positioning device by using a formed mark on object. The positioning device comprises a detector and a controller. A detector detects label and detector outputs the mark signal(S102). The substrate is exposed in the radiant energy by using the exposure device. The exposed substrate is developed. The developed substrate as described above is processed and device is manufactured.</p>
申请公布号 KR20090082139(A) 申请公布日期 2009.07.29
申请号 KR20090005696 申请日期 2009.01.22
申请人 CANON KABUSHIKI KAISHA 发明人 EGASHIRA SHINICHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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