ETCHANT COMPOSITION AND METHOD FOR FABRICATING METAL PATTERN

摘要

An etchant composition, and a method for forming a metal pattern using the composition are provided to decrease the side etching, the generation of residue and the damage of underlayer and to obtain the uniform etching characteristic. An etchant composition comprises 0.5~20 weight% of (NH4)2S2O8; 0.1~5 weight% of a phosphate; 0.01~1 weight% of a fluorine compound; 0.01~1 weight% of at least one kind of nitrogen compound selected from a heterocyclic amine and an aminocarboxylic acid compound; and 73~99.38 weight% of water.