| 摘要 |
A substrate processing apparatus is provided to reduce a time of positioning a substrate on a substrate chuck and to position the substrate accurately by using a plurality of position sensors. A substrate processing apparatus includes a chamber(20), a substrate chuck, a plurality of position sensors(42,43,44). A chamber provides a space for a process. A substrate chuck is positioned inside the chamber. The substrate chuck fixes the substrate. The plurality of position sensors are installed in an upper part of the substrate chuck. The plurality of position sensors determine whether the substrate is rightly positioned. The plurality of position sensors are installed along the edge of the substrate which is rightly positioned.
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