Systems and methods for creating MEMS gyros

摘要

Methods and systems for creating microelectromechanical system (MEMS) gyros. The methods and systems include generating a map of motor bias and creating MEMS gyros based on the map of motor bias to achieve a higher yield of usable MEMS gyros per wafer. The systems include a processor with components configured to determine paths of optimal motor bias for a given deep reactive ion etcher on a wafer, a stepper for imprinting a pattern for each gyro in an orientation that corresponds to the path of optimal motor bias each gyro is calculated to be most near on the wafer, and a deep reactive ion etcher to etch the gyros in the wafer.