发明名称 Lithographic apparatus and device manufacturing method
摘要 A device manufacturing method is disclosed that includes providing a substrate on a substrate table, the substrate having a target region comprising a plurality of generally planar surfaces, each surface having a different height relative to the substrate table, determining the relative heights of each generally planar surface, projecting a patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of one of the generally planar surfaces, moving the substrate table in a direction substantially parallel to the axis of the beam, and projecting the patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of another of the generally planar surfaces.
申请公布号 US7567340(B2) 申请公布日期 2009.07.28
申请号 US20060529732 申请日期 2006.09.29
申请人 ASML NETHERLANDS B.V. 发明人 GUI CHENG-QUN;BEST KEITH FRANK;VAN DEN BRINK ENNO;SUTEDJA BUDIMAN;BERGE PETER TEN
分类号 G03B27/58;G03B27/52 主分类号 G03B27/58
代理机构 代理人
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