发明名称 |
Generalization of the photo process window and its application to OPC test pattern design |
摘要 |
A method comprises the steps of: (a) simulating on a processor a fabrication of a plurality of layout patterns by a lithographic process; (b) determining sensitivities of the layout patterns to a plurality of parameters based on the simulation; (c) using the sensitivities to calculate deviations of the patterns across a range of each respective one of the parameters; and (d) selecting ones of the patterns having maximum or near-maximum deviations to be used as test patterns.
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申请公布号 |
US7568180(B2) |
申请公布日期 |
2009.07.28 |
申请号 |
US20050595703 |
申请日期 |
2005.02.22 |
申请人 |
PDF SOLUTIONS |
发明人 |
EISENMANN HANS;PETER KAI;CIPLICKAS DENNIS;BURROWS JONATHAN O.;ZHANG YUNQIANG ZHANG |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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地址 |
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