| 摘要 |
A polysilazane is provided to suppress ammonia substitution of a Si-H bond of the polysilazane, and to prevent excessive ammonia from being gone out in a process of changing the polysilazane to dielectric of SiO2. A method for manufacturing a polysilazane solution comprises the steps of: adding anhydrous liquid ammonia to pyridine maintained by (-44) to (-30) °C in weight ratio to 0.5:1 - 10:1 and when phase separation occurs, mixing the mixture; adding dichlrosilane and reacting the mixture for 5-24 hours; and removing the anhydrous liquid ammonia and then the pyridine by using a rotary evaporator; and adding dibutyl ether to the solution from which the pyridine is removed, to remove extra pyridine and filtering the product.
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