发明名称 |
METHODS FOR PERFORMING ACTUAL FLOW VERIFICATION |
摘要 |
<p>A method for determining an actual gas flow rate in a reaction chamber of a plasma processing system is provided. The method includes delivering gas by a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice, which is located upstream from the reaction chamber. The method also includes pressurizing the gas to create a choked flow condition within the orifice. The method further includes measuring a set of upstream pressure values of the gas via a set of pressure sensors. The method yet also includes applying a calibration factor of a set of calibration factors to determine the actual flow rate. The calibration factor is a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values, which is associated with an indicated flow rate for an MFC.</p> |
申请公布号 |
KR20090080529(A) |
申请公布日期 |
2009.07.24 |
申请号 |
KR20097010085 |
申请日期 |
2007.11.14 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
SHAREEF IQBAL A.;TIETZ JAMES V.;WONG VERNON;MEINECKE RICHARD J. |
分类号 |
H01L21/3065;H01L21/00;H01L21/02;H01L21/205 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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