| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress deterioration in imaging performance caused by the independent positional deviation of a first concave mirror and a second concave mirror. <P>SOLUTION: The exposure apparatus has a projection optical system OP which projects a pattern of an original 1 on a substrate 11. The projection optical system PO comprises the first concave mirror 6, a convex mirror 7, the second concave mirror 8, and a support mechanism supporting the first concave mirror 6 and the second concave mirror 8 disposed in an optical path between the original 1 and a substrate 11 in order from the side of the original 1. The difference between a reflecting surface of the first concave mirror 6 and a reflecting surface of the convex mirror 7 is different from the difference between a reflecting surface of the second concave mirror 6 and the reflecting surface of the convex mirror 7. The support mechanism includes a shelf-shaped frame including an upper member 105, an intermediate-stage member 107, a lower member 108, and a side member coupling ends thereof. The first concave mirror 6 is supported by the upper member 105 and intermediate-stage member 107, and the second concave mirror 8 is supported by the lower member 108. <P>COPYRIGHT: (C)2009,JPO&INPIT |
