| 摘要 |
<P>PROBLEM TO BE SOLVED: To precisely transfer a pattern onto a substrate by using a liquid immersion method. <P>SOLUTION: A main control unit 20 as an adjusting device finds aberration in a region irradiated with illumination light on a wafer, such as a temperature change coefficient to a change in a best focus position, based on measurement results (actual measurement values of temperature information of water between a projection optical system and the wafer) by temperature sensors 38A, 38B, and calculates the best focus positions at points of one side and the other side, for example, in a scanning direction in the region irradiated with light based on the temperature change coefficient. The main control unit 20 calculates the shape of an image surface (inclination of the image surface) of the projection optical system at that point, and performs the focus control and leveling control of the wafer so that the surface of the wafer substantially coincides with the image surface based on the calculation results, thus precisely transferring the pattern onto the wafer. <P>COPYRIGHT: (C)2009,JPO&INPIT |
