发明名称 |
METHOD FOR MANUFACTURING NOZZLE SUBSTRATE, NOZZLE SUBSTRATE, LIQUID DROPLET DISCHARGE HEAD, METHOD FOR MANUFACTURING LIQUID DROPLET DISCHARGE HEAD, AND LIQUID DROPLET DISCHARGE APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a nozzle substrate or the like which enables accuracy improvements of a plate thickness and a nozzle length by forming the nozzle substrate by film formation instead of forming by plate-thinning working such as grinding. SOLUTION: The method for manufacturing the nozzle substrate includes a process for film-forming a sacrificial layer 101 on a film formation substrate 100, a nozzle substrate base material forming process for film-forming a doped polysilicone layer 102 with phosphor doped therein as a nozzle substrate base material on the sacrificial layer 101, a nozzle hole forming process for forming nozzle holes in the doped polysilicone layer 102 by dry etching, and a stripping process for stripping the doped polysilicone layer 102 from the film formation substrate 100 by removing the sacrificial layer 101 by etching. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009154347(A) |
申请公布日期 |
2009.07.16 |
申请号 |
JP20070333663 |
申请日期 |
2007.12.26 |
申请人 |
SEIKO EPSON CORP |
发明人 |
ITODA MOTOKI;OTANI KAZUFUMI |
分类号 |
B41J2/135;B41J2/045;B41J2/055 |
主分类号 |
B41J2/135 |
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