发明名称 METHOD FOR MANUFACTURING NOZZLE SUBSTRATE, NOZZLE SUBSTRATE, LIQUID DROPLET DISCHARGE HEAD, METHOD FOR MANUFACTURING LIQUID DROPLET DISCHARGE HEAD, AND LIQUID DROPLET DISCHARGE APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a nozzle substrate or the like which enables accuracy improvements of a plate thickness and a nozzle length by forming the nozzle substrate by film formation instead of forming by plate-thinning working such as grinding. SOLUTION: The method for manufacturing the nozzle substrate includes a process for film-forming a sacrificial layer 101 on a film formation substrate 100, a nozzle substrate base material forming process for film-forming a doped polysilicone layer 102 with phosphor doped therein as a nozzle substrate base material on the sacrificial layer 101, a nozzle hole forming process for forming nozzle holes in the doped polysilicone layer 102 by dry etching, and a stripping process for stripping the doped polysilicone layer 102 from the film formation substrate 100 by removing the sacrificial layer 101 by etching. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009154347(A) 申请公布日期 2009.07.16
申请号 JP20070333663 申请日期 2007.12.26
申请人 SEIKO EPSON CORP 发明人 ITODA MOTOKI;OTANI KAZUFUMI
分类号 B41J2/135;B41J2/045;B41J2/055 主分类号 B41J2/135
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