METALLIC TIN-CONTAINING INDIUM OXIDE SINTERED COMPACT, SPUTTERING TARGET, AND METHOD FOR MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a sputtering target suppressing the generation of nodules during sputtering.

SOLUTION: The indium oxide sintered compact contains metallic tin, and the metallic tin is dispersed in the sintered compact. It is preferable that the bulk resistance thereof is ≥0.5 mΩcm and the density thereof is ≥6.8 g/cm3.

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