| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition method for forming a film layer having the wear resistance or the like on a surface of a base material such as metal, in which a film material can be reliably collected in a space between a film deposition too and the surface of a metallic base material for film deposition, the film deposition tool need not be intentionally pressed, the device constitution is easy, and a film of uniform thickness can be continuously formed on an extensive surface of the metallic base material, and a film deposition tool used for the film deposition method. SOLUTION: By using the film deposition tool in which a plurality of spirally inclined grooves are formed at nearly equal intervals from a bottom surface of a columnar body toward an outer circumferential surface of a side part, powder-like film material around a bottom part of the tool is collected and pressed in a space between the surface of the base material and the bottom surface of the tool, for generating the high temperature, the high pressure and the high shear stress. COPYRIGHT: (C)2009,JPO&INPIT |
