发明名称 GAS DELIVERY SYSTEM FOR AN ION SOURCE
摘要 <p>An ion source has an arc chamber with an electron-emitting element and a repeller. A manifold assembly defines a cavity and a gas outlet configured to allow gas flow to the arc chamber. This gas outlet is closer to the repeller than the electron-emitting element. In one embodiment, the ion source has a first crucible and a second crucible. The first crucible and the second crucible are connected to the manifold assembly. In one instance, the crucibles have tamper-resistant features.</p>
申请公布号 WO2009088770(A1) 申请公布日期 2009.07.16
申请号 WO2008US88155 申请日期 2008.12.23
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;SLOCUM, JOHN;KEEN, KEVIN, M.;CAMPBELL, CHRIS;LINDBERG, ROBERT;CASEY, STEFAN 发明人 SLOCUM, JOHN;KEEN, KEVIN, M.;CAMPBELL, CHRIS;LINDBERG, ROBERT;CASEY, STEFAN
分类号 H01L21/3065;H01L21/265 主分类号 H01L21/3065
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