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发明名称
雷射加工用之保护膜及使用它之加工方法
摘要
本发明提供一种黏着性高,能以均匀厚度保护加工物,可防止厚度不均所致之保护膜碳化 附着,且去除该保护膜时无排水污染问题之雷射加工用保护膜,及使用它之雷射加工方法。本发明的雷射加工用之保护膜系含有(甲基)丙烯酸酯共聚物、具有不饱和键之放射线聚合性(甲基)丙烯酸酯的膜状雷射加工用保护膜。
申请公布号
TW200930491
申请公布日期
2009.07.16
申请号
TW097147360
申请日期
2008.12.05
申请人
电气化学工业股份有限公司
发明人
武末博则;田口广一
分类号
B23K26/18(2006.01)
主分类号
B23K26/18(2006.01)
代理机构
代理人
何金涂;何秋远
主权项
地址
日本
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