| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device having target electrical characteristics. SOLUTION: A functional relationship between layout parameters and measured electrical characteristics is decided, and values of the layout parameters are extracted from design layout data of a semiconductor device given. Electrical characteristics of the semiconductor device to be manufactured from the design layout data are predicted by applying the values of the layout parameters to the functional relationship. The design layout data are changed with enumerated candidates of values of parameters instead of the values of the layout parameters extracted from the design layout data, and the design layout data of the semiconductor device are changed for manufacturing the semiconductor device. COPYRIGHT: (C)2009,JPO&INPIT
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