发明名称 SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE TRANSFER METHOD USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate transfer method using the same. SOLUTION: In the substrate processing apparatus 10, an interface unit transfers substrates between a first processing unit 30 and a second processing unit (exposure unit) 60, of a multi-layer structure. The interface unit is provided with substrate accommodating sections for carrying a substrate from and to the first processing unit. Buffer sections for preventing substrate transfer congestion are arranged in the interface unit or in the first processing unit. Thereby, the substrate transfer between the first processing unit and the second processing unit (exposure unit), of the multi-layer structure, can be performed more efficiently. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009158925(A) 申请公布日期 2009.07.16
申请号 JP20080284227 申请日期 2008.11.05
申请人 SEMES CO LTD 发明人 KIM DUK-SIK;LEE JOON-JAE
分类号 H01L21/677 主分类号 H01L21/677
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