发明名称 MANUFACTURING METHOD OF DISCHARGE HEAD
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a discharge head provided with less fluctuating and stable discharge characteristics. SOLUTION: In one embodiment, the method for manufacturing a discharge head is provided with a flow passage forming step of forming a flow passage for a liquid with a lithography method. In an exposure step, a mother substrate 103 is exposed in block by the use of a mask 200 having a plurality of flow passage exposure patterns C1 to C22 which are subjected to dimension correction corresponding to distances L from an exposure center E<SB>0</SB>with respect to reference distances for designing a plurality of flow passages. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009154501(A) 申请公布日期 2009.07.16
申请号 JP20070338588 申请日期 2007.12.28
申请人 SEIKO EPSON CORP 发明人 SAITO MASAYOSHI;ANAMI MAKOTO;SAITO TOSHIHIRO;IGARASHI TORU;HORI HIDEKI
分类号 B41J2/16 主分类号 B41J2/16
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