| 摘要 |
<p>Provided is a gas distribution system for use in feeding process gases to reaction zones, which includes a gas supply section, a switching section and a flow control section connected sequentially. The gas supply section is used to provide process gases and to feed them to the switching section. The switching section is used to stop feeding process gases required in the current process to the flow control section and to turn to feeding process gases required in the next process when the current process and the next process are switched. The flow control section is an integrated flow controller and is used to control the flow of process gasesaccording to process requirements and to feed the process gases to reaction zones. Moreover, provided is a semiconductor processing device using the above gas distribution system.</p> |
