发明名称 |
PROCESS FOR PRODUCING PLASMA DISPLAY PANEL AND PROCESS FOR PRODUCING SUBSTRATE STRUCTURE FOR PLASMA DISPLAY PANEL |
摘要 |
<p>This invention provides a process for producing a substrate structure for PDP, which can reduce the amount of a foam residue which stays in a dielectric layer after baking. The production process is characterized in that it comprises the step of forming a transparent electrode formed of ITO on a substrate, forming a glass layer so as to cover the transparent electrode, and baking the glass layer to form a dielectric layer, the glass in the glass layer is a glass frit substantially free from lead, the step of forming the transparent electrode comprises the step of forming an ITO film by sputtering under a mixed gas atmosphere containing a rare gas and an oxygen gas, and the flow rate ratio of the oxygen gas to the total flow rate of the mixed gas is 1.0 to 2.5%.</p> |
申请公布号 |
WO2009087773(A1) |
申请公布日期 |
2009.07.16 |
申请号 |
WO2008JP50199 |
申请日期 |
2008.01.10 |
申请人 |
HITACHI, LTD.;HAMANO, MIKIO;YAMANAKA, HIROSHI;KAWASAKI, TAKASHI |
发明人 |
HAMANO, MIKIO;YAMANAKA, HIROSHI;KAWASAKI, TAKASHI |
分类号 |
H01J9/02;H01J11/12;H01J11/24;H01J11/38 |
主分类号 |
H01J9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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