发明名称 PROCESS FOR PRODUCING PLASMA DISPLAY PANEL AND PROCESS FOR PRODUCING SUBSTRATE STRUCTURE FOR PLASMA DISPLAY PANEL
摘要 <p>This invention provides a process for producing a substrate structure for PDP, which can reduce the amount of a foam residue which stays in a dielectric layer after baking. The production process is characterized in that it comprises the step of forming a transparent electrode formed of ITO on a substrate, forming a glass layer so as to cover the transparent electrode, and baking the glass layer to form a dielectric layer, the glass in the glass layer is a glass frit substantially free from lead, the step of forming the transparent electrode comprises the step of forming an ITO film by sputtering under a mixed gas atmosphere containing a rare gas and an oxygen gas, and the flow rate ratio of the oxygen gas to the total flow rate of the mixed gas is 1.0 to 2.5%.</p>
申请公布号 WO2009087773(A1) 申请公布日期 2009.07.16
申请号 WO2008JP50199 申请日期 2008.01.10
申请人 HITACHI, LTD.;HAMANO, MIKIO;YAMANAKA, HIROSHI;KAWASAKI, TAKASHI 发明人 HAMANO, MIKIO;YAMANAKA, HIROSHI;KAWASAKI, TAKASHI
分类号 H01J9/02;H01J11/12;H01J11/24;H01J11/38 主分类号 H01J9/02
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