PLASMA PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of processing a sample to be processed stably for a long period by reducing damage to a processing chamber wall surface. SOLUTION: Disclosed is the plasma processing apparatus that processes the sample placed in a processing chamber in a vacuum container using plasma generated in the processing chamber, wherein the plasma processing apparatus includes an in-processing-chamber member which is disposed in the processing chamber to face the plasma and made of quartz containing 0.05 to 0.5% by weight of yttrium or 0.1 to 1% by weight of aluminum. COPYRIGHT: (C)2009,JPO&INPIT