| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming apparatus which can effectively remove a foreign material, has improved maintenability, and can also continuously form a film with high productivity and high operating efficiency, when forming the film on a long substrate. SOLUTION: The film-forming apparatus includes: a first evacuation means which evacuates the inside of a chamber to a predetermined degree of a vacuum; a film-forming section in which the film is formed on the surface to be film-formed of the substrate; a first transport roller which has a rotating shaft in a direction perpendicular to the direction to be transported of the substrate, contacts the surface to be film-formed of the substrate, and transports the substrate to the film-forming section; a second transport roller which has the rotating shaft in the direction perpendicular to the transport direction of the substrate, contacts the film-formed surface of the substrate on which a predetermined film has been formed, and transports the substrate; a first detecting means which detects the foreign material on the surface of the first transport roller; a first foreign material removing means which is provided in the downstream side in a rotation direction of the first transport roller from the first detecting means and removes the foreign material adherent to the surface of the first transport roller; and a control section which makes the first foreign material removing means remove the foreign material when the foreign matter has been detected. COPYRIGHT: (C)2009,JPO&INPIT
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