发明名称 |
Imprint-Lithographieverfahren, Gerät hierfür, sowie Verfahren zur Herstellung eines Halbleiterchips |
摘要 |
An imprint method for imprinting an imprint pattern of a mold onto a pattern formation material on a substrate so as to realize a high throughput includes the steps of bringing the imprint pattern and the pattern formation material into contact with each other; applying a first pressure between the mold and the substrate to increase a contact area between the imprint pattern and the pattern formation material; and adjusting a positional relationship between the mold and the substrate at a second pressure lower than the first pressure. |
申请公布号 |
DE602006007089(D1) |
申请公布日期 |
2009.07.16 |
申请号 |
DE20066007089T |
申请日期 |
2006.10.16 |
申请人 |
CANON K.K. |
发明人 |
SEKI, JUNICHI;SUEHIRA, NOBUHITO |
分类号 |
G03F7/00;B81C99/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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