| 摘要 |
<p>An exposure device (EX) for transferring a projection image of an object (M) onto a photosensitive substrate (P) by using plural projection optical modules (PLa to PLg) arranged with respect to the object comprises an adjustment mechanism (14) for changing the transfer characteristic of the projection image with respect to the photosensitive substrate, a storage means (80) in which transfer characteristic information indicating the transfer characteristic of each of the projection optical modules is stored, a joint information acquiring means for acquiring joint information corresponding to a joint between a first projection image and a second projection image which are joined on the photosensitive substrate of the projection image of the object, and a control means (CONT) for calculating an adjustment value of the adjustment mechanism corresponding to the characteristic difference in transfer characteristic between the first projection image and the second projection image at the joint from the transfer characteristic information and the joint information, operating the adjustment mechanism according to the adjustment value, and changing the transfer characteristic of at least one of the first projection image and the second projection image.</p> |
