| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for processing a restoration for increasing a restoration agent concentration in an insulating film when bringing a low-permittivity insulating film which has received a plasma damage into contact with a restoration agent and restoring it, efficiently advancing restoration processing and improving the characteristics of the insulating film after restoration as well. SOLUTION: When housing a substrate 5 with the insulating film damaged by plasma processing inside a chamber 1, introducing restoration agent steam into the chamber, heating the inside of the chamber and executing the damage restoration processing of the insulating film, the temperature of the inner wall of the chamber 1 is made higher than the temperature of the substrate. It is preferable that the temperature of the wall of the chamber is made higher than the boiling point of the restoration agent, and it is also preferable to elevate the temperature of the substrate 5 after introducing the restoration agent steam into the chamber. COPYRIGHT: (C)2009,JPO&INPIT
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