| 摘要 |
A method of forming a bonding pad opening is provided. A passivation layer and a mask layer are sequentially formed on a substrate having a bonding pad formed thereon. Thereafter, the passivation layer is etched to form an opening with use of an anti-reflection coating (ARC) layer of the bonding pad as an etching stop layer. Next, a dry removal process is performed to remove the mask layer. Afterwards, a wet cleaning process is performed to remove the residual mask layer or a polymer produced by previous manufacturing processes. Thereafter, the ARC layer is removed through performing an etching process with use of the passivation layer as a hard mask layer, so as to form the bonding pad opening.
|
