发明名称 POSITION MEASUREMENT SYSTEM AND LITHOGRAPHIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a measurement system easy to manufacture a grating or a pattern. <P>SOLUTION: The measurement system includes a sensor arranged to cooperate with a first pattern arranged on a structure of the measurement system to determine a first positional quantity of the sensor relative to the structure, and arranged to cooperate with a second pattern arranged on the structure to determine a second position quantity of the sensor relative to the structure, wherein the first and the second patterns are arranged on different surfaces of the structure. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009156862(A) 申请公布日期 2009.07.16
申请号 JP20080273658 申请日期 2008.10.24
申请人 ASML NETHERLANDS BV 发明人 BUTLER HANS;VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS
分类号 G01B11/00;G01D5/38;G03F7/20;H01L21/027 主分类号 G01B11/00
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