发明名称 SUBSTRATE TRANSFER EQUIPMENT WITH VARIABLE END EFFECTOR AND MULTI SUBSTRATE PROCESSING SYSTEM HAVING THE SAME
摘要 <p>A substrate transfer apparatus having a variable end effecter and a multi-substrate processing system including the same are provided to process multiple substrates at high speed by enhancing flexibility in a substrate transfer process. A substrate transfer apparatus includes one or more handling arms(430) and a variable end effecter(410). The variable end effecter is mounted on the handling arm. The variable end effecter includes a plurality of substrate holders(411,412,413). The position of the substrate holder is changed between a first location and a second location. The first position corresponds to an operating position. An operation for handling a substrate is performed at the first position. A second position corresponds to a standby position. The substrate is in a standby state at the second position.</p>
申请公布号 KR20090077865(A) 申请公布日期 2009.07.16
申请号 KR20080003695 申请日期 2008.01.12
申请人 NEW POWER PLASMA CO., LTD. 发明人 WI, SOON IM
分类号 H01L21/677;H01L21/683 主分类号 H01L21/677
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