ILLUMINATION OF PATTERNING DEVICE BASED ON INTERFERENCE FOR USE IN MASKLESS LITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To provide a system which enables radiation beams to be modulated.

SOLUTION: In a lithographic apparatus, beams of radiation are projected onto an array of individually controllable elements such that the beams interfere. Radiation that is further modulated by the array of individually controllable elements is projected onto a substrate.

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