摘要 |
<P>PROBLEM TO BE SOLVED: To form a high-accuracy pattern by increasing a drawing processing speed with a simple structure. <P>SOLUTION: In a DMD, six partial modulation domains D1 to D6 are defined to perform a step-and-repeat multiple exposure operation in accordance with an exposure pitch RS corresponding to the width of one partial modulation domain. In each exposure operation, an exposure-ON domain M<SB>ON</SB>is defined in which micro-mirrors are controlled based on raster data (drawing data) and an exposure-OFF domain M<SB>OFF</SB>is defined in which all the micro-mirrors in the modulation domains are set in an OFF state. Light is applied to a substrate SW by means of micro-mirrors in a partial modulation domain existing in the ON domain M<SB>ON</SB>. Further, a combination of partial modulation domains, which constitute the ON domain M<SB>ON</SB>and the OFF domain M<SB>OFF</SB>, is updated at each exposure operation to change the ON domain M<SB>ON</SB>and the OFF domain M<SB>OFF</SB>so that the ON domain M<SB>ON</SB>is cyclically shifted. <P>COPYRIGHT: (C)2009,JPO&INPIT |