EXPOSURE ILLUMINATION DEVICE AND METHOD FOR ADJUSTING DISPLACEMENT OF EXPOSURE PATTERN

摘要

PROBLEM TO BE SOLVED: To adjust an exposure pattern so as to control a displacement amount of the pattern within an allowance.

SOLUTION: An exposure illumination device includes: a light source 3 emitting UV rays; a condenser lens 5 converting the illumination light of UV rays emitted from the light source 3 into parallel beams to irradiate a photomask 1; a fly-eye lens 6 disposed between the light source 3 and the condenser lens 5 and producing a uniform luminance distribution of the illumination light irradiating the photomask 1; and an optical path length adjusting means 7 adjusting an optical path length between the condenser lens 5 and the fly-eye lens 6.

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