发明名称 VACUUM APPARATUS, VACUUM TREATMENT SYSTEM AND PRESSURE CONTROLLING METHOD OF VACUUM CHAMBER
摘要 PROBLEM TO BE SOLVED: To provide a vacuum treatment system preventing a gate valve from being suddenly opened, even when the supply of air for operating a gate valve provided in a vacuum chamber goes short. SOLUTION: In the pressure controlling mechanism 201, when the supply of air supplied to an air cylinder 123 is stopped, a port of a mechanical valve 121 is switched and an air operating valve 113 is opened, so that an external gas is gradually introduced into a conveying chamber 3 in a vacuum state through a port for vacuum leakage 109, a gas introducing piping 111 and a communicating hole 107. Since the pressure control in the conveying chamber 3 is performed in a state in which air for operating an air cylinder 47 is secured by a check valve 103 and a buffer tank 105, a sudden opening of a gate valve 7b is prevented. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009158627(A) 申请公布日期 2009.07.16
申请号 JP20070333439 申请日期 2007.12.26
申请人 TOKYO ELECTRON LTD 发明人 NABEYAMA HIROKI
分类号 H01L21/677 主分类号 H01L21/677
代理机构 代理人
主权项
地址