发明名称 MANUFACTURING METHOD OF PROBE FOR SCATTERING TYPE NEAR FIELD MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To manufacture a probe made of a material other than silicon with good processability in the same way as silicon. SOLUTION: A probe made of silicon is prepared and thermal oxidation treatment is applied to this probe under a steam atmosphere of 1,100°C to modified the probe to SiO<SB>2</SB>. Since the probe can be modified to SiO<SB>2</SB>while keeping the shape formed when silicon is processed, the probe made of SiO<SB>2</SB>having a sharp tip can be obtained. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009156601(A) 申请公布日期 2009.07.16
申请号 JP20070332023 申请日期 2007.12.25
申请人 INSTITUTE OF PHYSICAL & CHEMICAL RESEARCH 发明人 ONO ATSUSHI;HAYASAWA NORIHIKO;TAGUCHI ATSUKIYO;SAITO YUKA;KAWADA SATOSHI
分类号 G01Q60/22 主分类号 G01Q60/22
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