发明名称 |
INTEGRATED CIRCUIT SYSTEM EMPLOYING MULTIPLE EXPOSURE DUMMY PATTERNING TECHNOLOGY |
摘要 |
An integrated circuit system that includes: providing a substrate coated with a photoresist material; exposing the photoresist material to an energy source through a first mask to form a first substrate feature and a second substrate feature therein; and exposing the photoresist material to the energy source through a second mask to transform the second substrate feature into another one of the first substrate feature therein.
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申请公布号 |
US2009181551(A1) |
申请公布日期 |
2009.07.16 |
申请号 |
US20080972809 |
申请日期 |
2008.01.11 |
申请人 |
CHARTERED SEMICONDUCTOR MANUFACTURING LTD. |
发明人 |
TAN SIA KIM;GOH SOO MUAY;LIN QUNYING;YEO MARTIN |
分类号 |
H01L21/30 |
主分类号 |
H01L21/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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