摘要 |
A CVD reactor, such as a MOCVD reactor conducting metalorganic chemical vapor deposition of epitaxial layers, is provided. The CVD or MOCVD reactor generally comprises a flow flange assembly, adjustable proportional flow injector assembly, a chamber assembly, and a multi-segment center rotation shaft. The reactor provides a novel geometry to specific components that function to reduce the gas usage while also improving the performance of the deposition. |
申请人 |
VALENCE PROCESS EQUIPMENT, INC.;BEGARNEY, MICHAEL, J.;CAMPANALE, FRANK, J. |
发明人 |
BEGARNEY, MICHAEL, J.;CAMPANALE, FRANK, J. |